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    等离子辅助MOCVD

    Applied to the semiconductor industry:

    Processing Equipment-PVD-等离子沉积设备

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    等离子辅助MOCVD技术

    NMC-3000 等离子辅助MOCVD系统概述:NANO-MASTER针对InGaN及AlGaN沉积工艺所研发的台式等离子辅助金属有机化学气相沉积系统(PA-MOCVD),该系统具有5个鼓泡装置(各带独立的冷却槽)、加热的气体管路、950度样品台三个气体环、淋浴式气体分布的RF射频等离子源以及工艺终端的N2冲洗、250l/sec涡轮分子泵及无油真空泵(5 x 10-7Torr极限真空)、PC全自动控制,完全的安全互锁。

    目前,这项技术延伸到5个4"晶圆的立柜式独立批处理系统,该系统可以集成到集群配置中以满足高产量的要求。

    NMC-3000 等离子辅助MOCVD系统应用:Green LED’s (GaN, InGaN, AlGaN, ...)

    NMC-3000 等离子辅助MOCVD系统特点:

    • 台式系统
    • 5个带独立冷却槽的起泡器
    • 加热的气体管路
    • 950 °C样品台,2”晶圆片
    • 3个气体环
    • RF等离子源,带淋浴头气体分布
    • 工艺完成后N2自动冲洗
    • 极限真空5x10-7Torr
    • 260 l/s的涡轮分子泵串接无油干泵
    • 通过LabView软件实现PC计算机全自动控制
    • 菜单驱动,4级密码访问控制
    • 完整的安全联锁

     

    NMC-3000 等离子辅助MOCVD系统 Features:

    • Table Top System 
    • ive Bubblers with Individual Cooling Baths
    • Heated Gas Lines
    • 950 °C Platen, 2” Wafer
    • Three Gas Rings
    • RF Plasma Source with Shower Head Gas Distribution
    • N2 Flush after Process
    • 5x 10-7 Torr base Pressure
    • 250 l/sec Turbomolecular Pump with Oil Free Scroll Pump
    • PC Controlled with LabVIEW
    • Recipe Driven, Password Protected
    • Fully Safety Interlocked

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