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Magnetron Sputtering equipment
Popularity:251  Sales volume:0  Evaluation:0
unit price ￥0.00
in stock 100件
Brand AST
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AST Polychang Technology Psur-100VB Magnetic Enhanced Sputter is a mass production equipment designed for various metallization processes, diffusion barrier layer or reactive optical film applications.
application
AST Polychang Technology Psur-100VB Magnetic Enhanced Sputter is a mass production equipment designed for various metallization processes, diffusion barrier layer or reactive optical film applications. Especially in the production of III V semiconductors, the application of sputtering thin film deposition process has played an increasingly important role. The main applications can be divided into the following three categories:
(1) WTi/Au/Ti or Ti/Au
(2) TaN or TiWSiN
(3) ITO or SiO 2, Ti 2
Characteristic
In order to meet the demand of mass production, Psur-100VB adopts Batch Type large-scale automatic mass production function design, which can greatly reduce the instability of yield and quality caused by human needs and human negligence, and ensure the overall effective output. In addition, modular design, excellent uniformity of coating and batch production mode can increase the production capacity by 250% and further reduce users. Capital expenditure and occupied area of equipment. The features of Psur-100VB sputtering equipment include:
(1) high yield (80 * wafers for 2 ")
(2) Reproducibility and stability of high coating quality
(3) Excellent Batch to Batch coating uniformity (< 3%)
(4) It can be matched with batch automatic software control function.
(5) Up to 4 Cathodes of Target
(6) Can be matched with DC-Pulse or RF sputtering mode
(7) Suitable for different substrates. With the above functions, users can provide different operation modes for different production requirements.
Specifications

Wafer Numbers / Sizes
(80 -10) pcs / (2"- 6")

Sputter Cathodes
Up to 4 sets (Option)

Power Suppliers
DC, Pulsed-DCRF (Option)

Ultimate Pressure
<  5E-7 Torr

based Pressure
5E-6 Torr within 30 mins

Pumping System
Turbomolecular Pump + Rotary Pump or
Cryopump + Dry pump (Option)

Automatic Control System
Industrial HMI with Graphic User Interface

Substrate Temperature Control
RT ~ 350℃

Non-Uniformity
5% for WIW, WTWRTR

Power Requirement
AC220V, 3 phase, 60 Hz, 100A,

Dry N2 Requirement
1.2 kgw/cm2

CDA Requirement
5 kgw/cm2

Water Requirement
1.5 kgw/cm2, 20。, 40 l/min

Dimension (WxDxH)
1300 x 900 x 1800 (mm)

Weight
700 kgw
Contact information
the company:深圳市鑫志尚电子有限公司
status:Offline Send a letter Online conversation
Name:刘先生(Mr)
phone:0755-26906952
Mobile phone:13751175602
area:China-广东省
address:深圳市宝安区西乡恒丰工业城C1栋3楼
邮件:sales@semishare.com