UV光刻机
Mask Aligner
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ABM-LED Lithography Machine (Standard) Yihe Ruifeng





                        设备型号ABM/6/350/NUV/DCCD/M

ABM-LED lithography machine (standard type) is suitable for blue LED, red LED, green LED, white LED, green LED, TFT-LCD lithography, OLED lithography research and development and production, ABM-LED lithography machine (standard type) has high stability, durability, excellent performance and other outstanding features. Therefore, it is favored by most R&D institutions and production enterprises.

Optical system:

Exposure time moderator: 0.1 to 999.9 seconds (adjustable precision 0.1s)

365-400 nm light intensity sensor and power supply control circuit and feedback closed loop;

The sound-controlled power alarm device can prevent the system power from exceeding the set target.

Temperature and airflow sensors with safety protection devices;

Half-angle of ray deviation of panoramic collimating lens: <1.84 degrees;

Wavelength filter inspection and installation device

High efficiency reflecting mirror with anti-diffraction and reflection function;

Dichroic thermal lens device;

Anti-mercury lamp leakage device;

Equipped with fly eye prism device

Equipped with near-ultraviolet light source

- 365 nm output strength - about 18-20 mW/cm2

- 400 nm output strength - about 30-35 mW/cm2

Main configurations:

6 "Light Source System

Configuration of 2-inch or 4-inch chucks

Manual system (semi-automatic system, automatic alignment system optional)

Supporting 350W power supply

90-600 times continuous amplification CCD (convenient for LED substrate alignment)

Prism alignment device reduces the minimum dual field of view alignment to 10 mm (supporting LED debris lithography)

Main performance indicators:

Beam Uniformity::

-- < +1% over 2"region

-- < +2% over 4"region

- < +3% over 6"region

Contact pattern exposure characteristic size CD (near-ultraviolet NUV): 0.5 um

Support proximity exposure, feature size CD:

- 0.8um hard contact

- 1um 20um spacing

--2um 50um spacing

Frontal alignment accuracy (+0.5um)

Supporting LED excellent current control technology PSS process photolithography

Supporting vacuum, proximity and contact exposure

Supporting constant light intensity or constant power mode

 

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