Plasma Etching Eq...
¥100000.00
ICP (Inductively ...
Negotiable
等离子刻蚀设备
Negotiable
SENTECH SI500 电...
Negotiable
供应全自动紫外激...
Negotiable
Synapse等离子刻蚀...
Negotiable
Laurell湿法刻蚀台
Negotiable
镂空机
Negotiable
VHF蚀刻系统
Negotiable
5N C3F6 六氟丙烯 ...
Negotiable
4N CH3F 一氟甲...
Negotiable
5N CHF3 三氟甲烷...
Negotiable
GXE200系列等离子...
Negotiable
华林科纳酸碱刻蚀...
Negotiable
KOH刻蚀机
Negotiable
美国Trion 反应式...
Negotiable
等离子刻蚀机
Negotiable
Filmlab-R100 反应...
Negotiable
Filmlab-Si100 深...
Negotiable
硅片腐蚀设备
¥80000.00