Website Homepage

CN|EN

Current Position: Home » Consumable » Proc-Equip Consumable » Lapping&Polishing » 抛光液/粉 »砷化镓抛光液 二氧化硅高纯 半导体加工抛光研磨耗材 光亮剂 光学件抛光
    Shipping 关注:87

    砷化镓抛光液 二氧化硅高纯 半导体加工抛光研磨耗材 光亮剂 光学件抛光

    Applied to the semiconductor industry:

    Proc-Equip Consumable-Lapping&Polishing-抛光液/粉

    Product Brand

    天津西美半导体材料有限公司

    Specification model:

    CM-S700A

    Delivery period:

    商议Day

    In stock:

    100000

    Place of origin:

    China-天津市

    Quantity:

    cut back increase

    Price:

    Negotiable
    Transaction guarantee Secured Transactions Online banking to pay

    Consumer Hotline:00864001027270

    Brand:天津西美半导体材料有限公司

    Model:CM-S700A

    Own series:Proc-Equip Consumable-Lapping&Polishing-抛光液/粉

                CM-S700A主要由高纯度胶态二氧化硅组成,特别适用于2-6寸GaAs晶片的抛光,具有稳定性和分散性良好,去除率高、表面粗糙度小以及对工件无损伤等优点。即使在稀释倍率很高的情况下使用,仍具有很好的抛光效率和使用寿命。

     

      CM-S700 is a colloidal silica slurry developed especially for polishing 2-6 inches GaAs wafer, with excellent particle stability and dispersal, it possesses a high removal rate, good surface effects and damage-free polishing. Even when used at high dilutions, CM-S700 delivers excellent processing efficiency and long slurry life.

    Advisory

    If you have any questions before purchasing, please contact us.

    Question:
     

    Related similar products in semiconductor industry:

    Service Hotline

    4001027270

    Function and characteristics

    Prices and offers

    WeChat public number