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Current Position: Home » Consumable » Proc-Equip Consumable » Lapping&Polishing » 抛光液/粉 »砷化镓抛光液 二氧化硅高纯 半导体加工抛光研磨耗材 光亮剂 光学件抛光
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    砷化镓抛光液 二氧化硅高纯 半导体加工抛光研磨耗材 光亮剂 光学件抛光

    Applied to the semiconductor industry：

    Proc-Equip Consumable-Lapping&Polishing-抛光液/粉

    Product Brand

    天津西美半导体材料有限公司

    Specification model：

    CM-S700A

    Delivery period：

    商议Day

    In stock：

    100000

    Place of origin：

    China-天津市

    Quantity：

    cut back increase

    Price：

    Negotiable
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    Brand：天津西美半导体材料有限公司

    Model：CM-S700A

    Own series：Proc-Equip Consumable-Lapping&Polishing-抛光液/粉

                CM-S700A主要由高纯度胶态二氧化硅组成，特别适用于2-6寸GaAs晶片的抛光，具有稳定性和分散性良好，去除率高、表面粗糙度小以及对工件无损伤等优点。即使在稀释倍率很高的情况下使用，仍具有很好的抛光效率和使用寿命。

     

      CM-S700 is a colloidal silica slurry developed especially for polishing 2-6 inches GaAs wafer, with excellent particle stability and dispersal, it possesses a high removal rate, good surface effects and damage-free polishing. Even when used at high dilutions, CM-S700 delivers excellent processing efficiency and long slurry life.

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