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    锗透镜

    Applied to the semiconductor industry:

    Sensor and Chip-Lens&Filter

    In stock:

    10000

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    National

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    Own series:Sensor and Chip-Lens&Filter

     在2-12μm范围内,锗是制作高效红外成像系统中光学镜头和光学窗口最常用的材料。锗具有高折射率(2-14μm波段时约为4.0)、表面最小曲率和色差小的特性,在低功率成像系统中,通常不需要修正。

      锗受温度影响严重,透过率随温度的升高而降低,因此,它们只能在100摄氏度以下应用。在设计对重量有严格要求的系统的时候要考虑锗的密度(5.33 g/cm3)。锗主要应用在热成像系统和前视红外(FLIR)领域里面。

     

      锗透镜

      材料 锗

      类型 平凸 平凹 双凸 双凹 弯月

      直径 5-300mm+0/-0.2

      小心偏 <3分

      焦距公差 ±2%

      面形 △N<λ/4@633nm

      表面质量 60/40

      通光孔径 >90%

      倒角 保护性<0.5mmX45度

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