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    Oxidator150-高温氧化炉

    Applied to the semiconductor industry:

    Processing Equipment-Furnace-高温炉

    Product brand

    Centrotherm

    In stock:

    1000

    Place of origin:

    Germany

    Quantity:

    cut back increase

    price:

    1000.00
    Transaction guarantee Secured Transactions Online banking to pay

    Brand:Centrotherm

    model:

    Own series:Processing Equipment-Furnace-高温炉

     

    Oxidator 150

    高温氧化炉

     

    Oxidator 150 高温炉由 centrotherm thermal solutions 设计开发,专门用于硅-碳化合物(SiC)的氧化处理。设备最高可承受 1400°C 的工艺温度,氧化工艺使用 O2、N2O、NO、NO2 或湿法氧化气体,灵活性和工艺质量极佳。

    Oxidator 150 装有非金属加热装置和双真空,是当前市场上最安全的毒性气体氧化炉。

     

    批量处理 2“、3“、100 mm 和 150 mm 硅片或任何其它组合
    最高加热率可达 7.5 K/min
    批量规模高达 50片硅片(150 mm)
    工艺压力:850 mbar 至常压下

     

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