-
原子层沉积 ALD P-...
Negotiable
-
原子层沉积 ALD P-...
Negotiable
-
原子层沉积 ALD P-...
Negotiable
-
原子层沉积 ALD P-...
Negotiable
-
磁控溅射设备
Negotiable
-
专业生产制备金刚...
Negotiable
-
日本真空PVD
Negotiable
-
脱氧炉
Negotiable
-
链式烧结炉
Negotiable
-
PECVD
Negotiable
-
磁性材料专用设备
Negotiable
-
扩散炉
Negotiable
-
DENTON Discovery ...
Negotiable
-
平板PECVD
Negotiable
-
LPCVD
Negotiable
-
干法刻蚀系统
Negotiable
-
X4干法释放设备
Negotiable
-
HF干法释放系统
Negotiable
-
E2干法释放设备
Negotiable
-
OKAMOTO全自动研磨...
Negotiable