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Product Thickness:0.5 – 3.0mm.
Chemical Polishing Cloth is designed to satisfy the exacting requirements of chemo-mechanical polishing. The black napped urethane surface layer is intrinsic to the substrate giving superior nap strength and longer pad life.
Chemical Polishing pads are supplied with a protected self-adhesive backing and each cloth is hermetically sealed in a polythene sachet.
Product Diameter: 300mm, 350mm, 400mm,420mm,600mm.
Product Thickness:0.5 – 3.0mm.
Expanded Polyurethane Polishing Pad is designed to satisfy the exacting requirements of Si and similar material fine polishing. According to different process application, the surface of pad have two kinds of type: groove and non-groove.
Expanded Polyurethane Polishing Pads are supplied with a protected self-adhesive backing and each cloth is hermetically sealed in a polythene sachet.
