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应用领域：IC FAB
设备特点：
This is a higher throughput, upgraded version of the highly regarded, highly reliable platform with additional features not available on the original. JAC has a flexible system design to support immersion ArF lithography processes, including top-coat coating and removal. JAC immersion option package incorporates SOKUDO’s unique wafer clean and dry technology which is particularly useful in preventing defects in immersion process.
