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    LPCVD system(低压力化学气相沉积系统)

    Applied to the semiconductor industry:

    Processing Equipment-PVD-LPCVD

    In stock:

    1

    Place of origin:

    National

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    Own series:Processing Equipment-PVD-LPCVD

     LPCVD system(低压力化学气相沉积系统)。设备主要部件全部选用国际主流知名品牌,适用于IC芯片制造、可控硅芯片制造、二三极管芯片制造、整流桥芯片制造、太阳能电池芯片制造等各种芯片造行业。涵盖工艺包括:LTO(二氧化硅)、PSG(磷硅玻璃)、SIPOS(半绝缘多晶硅)、POLY(多晶硅)、SI3N4(氮化硅)、TEOS等。设备成熟稳定安全可靠,可配套提供相应工艺技术支持。

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