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Current Position: Home » Equipment » Processing Equipment » PVD » 磁控溅射机 »Filmlab-S100 溅射台
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    Filmlab-S100 溅射台

    Applied to the semiconductor industry：

    Processing Equipment-PVD-磁控溅射机

    In stock：

    1

    Place of origin：

    National

    Quantity：

    cut back increase

    price：

    Negotiable
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    Brand：

    model：

    Own series：Processing Equipment-PVD-磁控溅射机

     Sputtering for Au、Ag、Pt、W、Mo、Ta、Ti、Al、Si、ITO、and magnetic materials

     

    base : 4inch 6inch 8inch

    Uniformity: ≤±4%

    Deposition rate：According to the different materials

    Gas :  Ar、N2、O2 and customer order

    baking： 120° or can be order

    Film thickness monitor：can be order

    Co-sptttering：can be order

    advisory

    If you have any questions before purchasing, please contact us.

    Question:
     
    Ask

    请问设备使用的靶材是平面型的还是辊型的？靶材的利用率能达到68%吗？

    dfft  2017-08-03

    Answer

     您好，是平面型，园靶材，不是大型生产设备，利用率到不了68%这么高。
    谢谢

    2017-08-12

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