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977 8” Wafer Cleaning System977 8英寸 晶圆清洗系统——977清洗机
Standard Features: 基本配置
Supporting up to 8"round substrates 最大支持到8吋的工作台
Atomizing cleaning 支持二流体清洗
Programmable recipes 可编程菜单
Storage capacity: 8 recipes 存储容量,可以存储8种
Internal vacuum generator 内含真空发生器
Spinner velocity range: 200-3,000 RPM 工作台转速可控,
200-3000转/分钟
Nitrogen and water adjustable pressure gages 二氧化氮和水
可调压力可调检测
Process monitoring and display 工作可控和展示
Automatic covering/opening 自动开合
Safety interlock 内含安全锁
Light tower
Dimensions (WxDxH): 410x625X946 mm 尺寸
If you have any questions before purchasing, please contact us.