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    精密研磨系统

    Applied to the semiconductor industry:

    Processing Equipment-Lapping&Polishing-抛光机

    Specification model:

    Gnad61

    Delivery period:

    3个月Day

    In stock:

    2

    Place of origin:

    United Kingdom

    Quantity:

    cut back increase

    price:

    Negotiable
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    Brand:

    model:Gnad61

    Own series:Processing Equipment-Lapping&Polishing-抛光机






    详细描述:
    1.加工样品尺寸8英寸及以下尺寸样品
    2.可磨抛样品数量设备具有1个工位,最大可以加工8英寸样品.
    3.可加工样品种类Si,SiC, GaAs, InP,CZT, MCT等多种半导体材料
    4.整机防腐蚀,适用CMP应用设备主机及所有零部件耐腐蚀,适用CMP应用
    5.设备工作时间,磨抛盘转速,样品固定系统驱动转速及摆幅等参数采用精确数控,所有参数具有数据存储及记忆功能。所有控制系统部件上置于磨抛工作区域,以避免磨抛工作过程中磨抛废料渗漏腐蚀操控系统。

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