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    UETCH HF干法刻蚀系统

    Applied to the semiconductor industry:

    Processing Equipment-Etching-HF刻蚀设备

    Specification model:

    单片式

    In stock:

    2

    Place of origin:

    United Kingdom

    Quantity:

    cut back increase

    price:

    Negotiable
    Transaction guarantee Secured Transactions Online banking to pay

    consumer hotline:00864001027270

    Brand:

    model:单片式

    Own series:Processing Equipment-Etching-HF刻蚀设备

    详细介绍:详细描述:SPTS公司拥有自主知识产权的无水氢氟酸气相刻蚀工艺。相比市面上其他厂商以液态氢氟酸气化或者其他载气输运模式,SPTS采用以气态乙醇作为载气与
    气态氢氟酸混合后对二氧化硅介质进行选择性蚀刻,并及时处理在反应过程中出现的水汽,真正做到无水刻蚀。一方面体现出对硅衬底,金属以及低应力氮化硅等都有非常好的选
    择性,因为在水汽作用下,金属等其他材料也会被氢氟酸所腐蚀;另一方面在没有水汽的环境中供刻蚀释放的器件不会出现由于液态张力而与衬底表面的粘附性失效。 

    SPTS的HF氢氟酸刻蚀设备提供多方面的工艺可调性,客户可以根据本身产品的需求在工艺温度,工艺压力,各种气体分压,各种气体流量等参数中选择最适合的参数来优化产品
    性能。

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