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纳米压印模块
（特色NIL技术）
OAI纳米压印模块系统是一种模块化附件，可用于任何光刻机。 这种创新技术是由Hewlett Packard开发的一种低成本的研究和开发解决方案。 它使得能够使用高产率脱模技术，并且适用于几乎所有的光刻机系统。
Nanoimprint Module(featuring NIL Technology)
The OAI Nanoimprint Module System is a modular add-on that may be used on any mask Aligner. This innovative technology was developed at Hewlett Packard as a low-cost solution for research and development efforts. It enables the use of high-yield mold release technology and is adaptable to virtually all mask Aligner systems.
