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Current Position: Home » Equipment » Processing Equipment » Lithography » 步进光刻机 »NSR2005i12D光刻机 上海卓晶半导体科技有限公司
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    NSR2005i12D光刻机 上海卓晶半导体科技有限公司

    Applied to the semiconductor industry：

    Processing Equipment-Lithography-步进光刻机

    Product brand

    卓晶

    In stock：

    100

    Place of origin：

    National

    Quantity：

    cut back increase

    price：

    Negotiable
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    ￥29500.00

    Brand：卓晶

    model：

    Own series：Processing Equipment-Lithography-步进光刻机

    NSR2005i12D光刻机 上海卓晶半导体科技有限公司 设备商城

    NSR2005i12D主要用于CD线宽不超过0.35μm器件的生产。

    主要技术指标

     

    分辨率

    0.35μm

    Resolution

    0.35μm

    N.A.

    0.63

    N.A.

    0.63

    曝光光源

    365nm

    Exposure light source

    365nm

    倍率

    1:5

    Magnification

    1:5

    最大曝光市场

    22mmX22mm

    Maximum Exposure area

    22mmX22mm

    对准精度

    55nm

    Alignment accuracy

    55nm

    提供4”、5”、6”、8”、设备改造。

    常年提供所有备件、耗材。

    更多型号设备欢迎致电或浏览我们的网站。

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