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    Filmlab-R100 反应离子刻蚀机

    Applied to the semiconductor industry:

    Processing Equipment-Etching-反应离子刻蚀机

    Delivery period:

    合同签订6个月Day

    In stock:

    2

    Place of origin:

    China

    Quantity:

    cut back increase

    price:

    Negotiable
    Transaction guarantee Secured Transactions Online banking to pay

    Brand:

    model:

    Own series:Processing Equipment-Etching-反应离子刻蚀机

      可使用常规F基气体刻蚀Si、SiO、SiN、石英等材

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    Question:
     
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    你们这个用的是什么气体??HF吗?

    gookjll  2017-08-07

     不用HF,可以使用CF4,SF6,CHF3,C4F8,O2,Ar,等各种F基气体,特殊也可以订做Cl基气体的。

    2017-08-12

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