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    第二代电介质刻蚀设备 Primo AD-RIE

    Applied to the semiconductor industry:

    Processing Equipment-Etching

    Product brand

    中微

    In stock:

    10000

    Place of origin:

    China-上海市

    Quantity:

    cut back increase

    price:

    Negotiable
    Transaction guarantee Secured Transactions Online banking to pay

    consumer hotline:00864001027270

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    Brand:中微

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    Own series:Processing Equipment-Etching

     

    Primo AD-RIE™是中微公司用于流程前端(FEOL)及后端(BEOL)关键刻蚀应用的第二代电介质刻蚀设备,主要用于22纳米及以下的芯片刻蚀加工。基于前一代产品Primo D-RIE刻蚀设备已被业界认可的性能和良好的运行记录,Primo AD-RIE做了进一步的改进:采用了具有自主知识产权的可切换低频的射频设计,优化了上电极气流分布及下电极温度调控的设计。

    Primo AD-RIE已经成功通过了3000片晶片马拉松测试。除已证实其具备更优越的重复性及稳定性以外,该产品还可将晶片上关键尺寸均匀度控制在2纳米内。

    系统特点及技术优势

    2-13.5兆赫兹可切换射频发生器在多膜层结构的刻蚀能改善工艺水平

    独特的射频输入和对称分布改善等离子密度的均匀分布

    三区气体分布为刻蚀速度的均匀度提高有效的可调性

    静电吸盘双区冷却装置提高晶片温度可调性,极大改善晶圆片刻蚀均匀度

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