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Current Position: Home » Equipment » Processing Equipment » Lithography » 双面光刻机 »MEMS专用EVG光刻机
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    MEMS专用EVG光刻机

    Applied to the semiconductor industry：

    Processing Equipment-Lithography-双面光刻机

    Product brand

    EVG

    Specification model：

    EVG610单面/双面光刻机

    Delivery period：

    6个月Day

    In stock：

    1

    Place of origin：

    China-上海市

    Quantity：

    cut back increase

    price：

    ￥1.00
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    ￥29500.00

    Brand：EVG

    model：EVG610单面/双面光刻机

    Own series：Processing Equipment-Lithography-双面光刻机

     u 支持背面对准光刻和键合对准工艺

    u 自动的微米计控制曝光间距

    u 自动契型补偿系统

    u 优异的全局光强均匀度

    u 免维护单独气浮工作台

    u 最小化的占地面积

    u Windows图形化用户界面

    u 完善的多用户管理（用户权限、界面语言、菜单和工艺控制）

    advisory

    If you have any questions before purchasing, please contact us.

    Question:
     
    Ask

    请问你们这个CCD对准精度多高？衬底尺寸 规格一般都是多少？

    gookjll  2017-08-07

    Answer

     您好！

    可否留下您的联系方式

    我给您详细的技术参数！

    谢谢

    8寸以下兼容 对准精度 顶部0.5um  底部 1um 

    娄 13122976482

    2017-08-07

    Ask

    基片的尺寸范围多大？分辨率、对准精度多高？

    sjfh  2017-08-14

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