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    EVG 双面对准光刻机

    Applied to the semiconductor industry:

    Processing Equipment-Lithography-双面光刻机

    In stock:

    1

    Place of origin:

    National

    Quantity:

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    Negotiable
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    Own series:Processing Equipment-Lithography-双面光刻机

     EVG光刻机主要应用于半导体光电器件、功率器件、微波器件及微电子机械系统(MEMS)、硅片凸点、化合物半导体等领域,涵盖了微纳电子领域微米或亚微米级线条器件的图形光刻应用。

     

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    这个对准误差会不会超过0.5微米??

    gookjll  2017-08-07

     理想的情况下是不会超过0.5微米,主要看客户的产品。

    2017-08-07

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