200型光刻机

 

OAI 200型光刻机是一种具有成本效益的高性能掩模对准器，采用经过行业验证的组件，使OAI成为光刻设备行业的领导者。 200型是台式面罩对准器，需要最小的洁净室空间。它为研发，或有限规模，试点生产提供了经济的替代方案。利用创新的空气轴承/真空吸盘调平系统，衬底快速平稳地平整，用于平行光掩模对准和在接触曝光期间在晶片上的均匀接触。该系统能够实现一微米分辨率和对准精度。

对准模块具有掩模插入件组和快速更换晶片卡盘，其便于使用各种衬底和掩模，而不需要用于重新配置的特殊工具。对准模块包括X，Y和Z轴的微米。

200型掩模对准器具有可靠的OAI紫外光源，其在近紫外或深紫外中提供准直的紫外光，使用功率从200至2000瓦的灯。双传感器，光学反馈回路连接到恒定强度控制器，以提供在所需强度的±2％内的曝光强度的控制。可以快速和容易地改变UV波长。该掩模Aligner是一种灵活，经济的解决方案，适用于任何入门级掩模对准和UV曝光应用

Model 200 Mask Aligner

The OAI Model 200 Mask Aligner is a cost-effective high performance mask Aligner that has been engineered with industry proven components that have made OAI a leader in the photolithography capital equipment industry. The Model 200 is a bench top mask Aligner that requires minimal cleanroom space. It offers an economic alternative for R&D, or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The system is capable of one micron resolution and alignment precision.

The alignment module features mask insert sets and quick-change wafer chucks that facilitate the use of a variety of substrates and masks without requiring special tools for reconfiguration. The alignment module incorporates micrometers for X, Y, and Z-axis.

The Model 200 Mask Aligner features a dependable OAI UV light source which provides collimated UV light in Near or Deep UV using lamps ranging in power from 200 to 2000 watts. Dual-sensor, optical feedback loops are linked to the constant intensity controller to provide control of exposure intensity within ±2% of the desired intensity. Changes may be made to the UV wavelength quickly and easily. This mask Aligner is a flexible, economic solution for any entry-level mask alignment and UV exposure application.