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    Mask Aligner

    Applied to the semiconductor industry:

    Processing Equipment-Lithography-UV光刻机

    Product brand

    Cee®

    Specification model:

    ABM-LED

    In stock:

    100

    Place of origin:

    United States

    Quantity:

    cut back increase

    price:

    10000.00
    Transaction guarantee Secured Transactions Online banking to pay

    consumer hotline:00864001027270

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    Concerned Products

    Brand:Cee®

    model:ABM-LED

    Own series:Processing Equipment-Lithography-UV光刻机

    ABM-LED Lithography Machine (Standard) Yihe Ruifeng





                            设备型号ABM/6/350/NUV/DCCD/M

    ABM-LED lithography machine (standard type) is suitable for blue LED, red LED, green LED, white LED, green LED, TFT-LCD lithography, OLED lithography research and development and production, ABM-LED lithography machine (standard type) has high stability, durability, excellent performance and other outstanding features. Therefore, it is favored by most R&D institutions and production enterprises.

    Optical system:

    Exposure time moderator: 0.1 to 999.9 seconds (adjustable precision 0.1s)

    365-400 nm light intensity sensor and power supply control circuit and feedback closed loop;

    The sound-controlled power alarm device can prevent the system power from exceeding the set target.

    Temperature and airflow sensors with safety protection devices;

    Half-angle of ray deviation of panoramic collimating lens: <1.84 degrees;

    Wavelength filter inspection and installation device

    High efficiency reflecting mirror with anti-diffraction and reflection function;

    Dichroic thermal lens device;

    Anti-mercury lamp leakage device;

    Equipped with fly eye prism device

    Equipped with near-ultraviolet light source

    - 365 nm output strength - about 18-20 mW/cm2

    - 400 nm output strength - about 30-35 mW/cm2

    Main configurations:

    6 "Light Source System

    Configuration of 2-inch or 4-inch chucks

    Manual system (semi-automatic system, automatic alignment system optional)

    Supporting 350W power supply

    90-600 times continuous amplification CCD (convenient for LED substrate alignment)

    Prism alignment device reduces the minimum dual field of view alignment to 10 mm (supporting LED debris lithography)

    Main performance indicators:

    Beam Uniformity::

    -- < +1% over 2"region

    -- < +2% over 4"region

    - < +3% over 6"region

    Contact pattern exposure characteristic size CD (near-ultraviolet NUV): 0.5 um

    Support proximity exposure, feature size CD:

    - 0.8um hard contact

    - 1um 20um spacing

    --2um 50um spacing

    Frontal alignment accuracy (+0.5um)

    Supporting LED excellent current control technology PSS process photolithography

    Supporting vacuum, proximity and contact exposure

    Supporting constant light intensity or constant power mode

     

    advisory

    If you have any questions before purchasing, please contact us.

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