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    URE-2000/35型紫外光刻机 成都晶普科技有限公司

    Applied to the semiconductor industry:

    Processing Equipment-Lithography-UV光刻机

    Product brand

    晶普

    In stock:

    100

    Place of origin:

    National

    Quantity:

    cut back increase

    price:

    Negotiable
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    consumer hotline:00864001027270

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    Brand:晶普

    model:

    Own series:Processing Equipment-Lithography-UV光刻机

    产品名称:URE-2000/35型紫外光刻机

    主要技术指标:

    曝光面积:100mm×100mm
    分辨力:1um(胶厚1.5μm的正胶)
    对准精度:±0.8μm
    最大胶厚:300μm(SU8胶)
    掩模尺寸:2.5 inch、3 inch、4 inch、5 inch
    样片尺寸:直径Ф15mm--Ф100mm、厚度0.1mm--6mm(可扩展为15mm);
    照明均匀性:±4%(Ф100mm 范围)
    汞灯功率:350W(直流)
    掩模相对于样片运动行程:X: ±5mm; Y: ±5mm; θ: ±6°

    技术特点:

    创新采用三柔性支点实现高精度自动调平;真空接触自动曝光;样片升降、调平、接触、曝光、复位实现自动化控制;采用积木错位蝇眼透镜实现高均匀照明;可连续设定分离间隙;采用双目双视场显微镜实现高对准精度。整机具有性能可靠、操作方便、自动化程度高等特点。

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