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    URE-2000S/A型紫外光刻机 成都晶普科技有限公司

    Applied to the semiconductor industry:

    Processing Equipment-Lithography-UV光刻机

    In stock:

    100

    Place of origin:

    China-四川省

    Quantity:

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    price:

    Negotiable
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    consumer hotline:00864001027270

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    Own series:Processing Equipment-Lithography-UV光刻机

    产品名称:URE-2000S/A型紫外光刻机

    主要技术指标:

      曝光面积:150mm×150mm
      分辨力:1μm(胶厚1.5 μm的正胶)
      对准精度:±3μm(双面)
      最大胶厚:500μm(SU8胶)
      掩模尺寸:3inch、4 inch、5 inch、7 inch
      样片尺寸:直径Ф30mm--Ф150mm 厚度0.1mm--6mm(可扩展为15mm)
      照明均匀性:±3.5%Ф100mm) ±5.5%(Ф150mm)
      汞灯功率:1000W(直流)
      掩模相对于样片运动行程:X: ±5mm; Y: ±5mm; θ: ±6°

    技术特点:

    该机采用国内首创的CCD图像底面对准技术,单曝光头正面曝光实现双面对准的总体设计技术。采用新颖的高精度、多自由度掩模—样片精密对准工件台结构设计,掩模—样片对准过程直观,套刻对准速度快、精度高。掩模板与样片的放置采用推拉式基准平板、真空吸附式,操作方便。

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