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    DS-2000/14G型光刻机

    Applied to the semiconductor industry:

    Processing Equipment-Lithography-UV光刻机

    Product brand

    晶普

    In stock:

    100

    Place of origin:

    China-四川省

    Quantity:

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    price:

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    Brand:晶普

    model:

    Own series:Processing Equipment-Lithography-UV光刻机

    产品名称:DS-2000/14G型光刻机

    主要技术指标:

    单次曝光面积:1.4mm×1mm
    最大曝光基片:100mm ×100mm
    对准精度:±0.8μm(半自动对准)
    最大胶厚:300μm(SU8胶)
    自动逐场对焦;
    分辨力:1μm;
    X、Y、Z、θ四自由度电动位移台
    X、Y平移重复定位精度:0.65μm(3σ)
    Z向运动精度:1μm

    技术特点:

    该机可采用紫外光、深紫外光、甚至更短波长的极紫外光作为光源,用DMD数字微镜阵列替代传统掩模板,采用积木 错位蝇眼透镜实现高均匀照明,并配备了双目双视显微镜和CCD图象对准系统(可同时使用),拼接获得大面积图形,曝光设定采用微机控制,菜单界面友好,操作简便。

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